Fab Operation
GaN, SiC, GaAs, InP
III-V and wide-bandgap device fabrication: epitaxy-adjacent processing, implant activation, metallization, and device test.
Spin coater
The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.
The Laurell Lz-23 B is a compact 650-series spin coater that accommodates up to 150 mm wafers and 5 in × 5 in substrates.
The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.
The Laurell H6-23 is a compact HL Series spin coater for wafers and substrates, with a maximum rotational speed of 12,000 RPM.
The Laurell WS-650-8B is a compact 650-series spin coater with a maximum rotational speed of 12,000 RPM and support for wafers up to 200 mm.
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
The KLA FT-750 is a visible light spectrophotometer-based thin film measurement system for semiconductor process control.
The Laurell SU-8 is a spin station dedicated to applying SU-8 photoresist for lithography processes.
The SUSS MicroTec MA 8 / BA 6 Wafer is a wafer aligner categorized under Lithography.
Etch
III-V etch chemistry differs from silicon — plan dedicated chambers
The Tegal 901G is a diode plasma etcher specially configured for GaAs processing and used for etching high-performance devices on gallium arsenide substrates.
The Lam Research TCP 9400 ICP is an inductively coupled plasma etcher from Lam Research.
Lam Research A 6 Exelan HPT is a dielectric etch tool configured for 8-inch wafers and identified with Exelan HPT chambers.
The Lam Research 2300 Exelan Flex is an etch tool, with sources describing it as an etch chamber or etcher.
The Oxford NGP80 RIE is a plasma etch system located in room W1-062.
Deposition
The Denton SJ20C is an electron-beam evaporation tool used for physical vapor deposition of a wide range of materials.
The Applied Materials Centura Ultima+ HDP is a chemical vapor deposition system for 6-inch wafers, equipped with an ENI AM200 RF generator.
The Denton Explorer 14 RF Sputterer is an RF sputterer manufactured by Denton Vacuum.
The Lam / Novellus / Gasonics Triple Speed NF is a chemical vapor deposition (CVD) system with three HDP chambers, a Brooks robot, SLM type, three ports, and loadlock helium reduction.
The Applied Materials Producer III is a chemical vapor deposition (CVD) system.
Thermal / Diffusion
Activation anneal pairs directly with implant
The Tokyo Electron A 8 S ZA is a PoCl3 furnace with an EPROM based control system.
The YES 12-2P-CP is a manual-load high-temperature cure oven for MEMS and semiconductor process applications.
YES-3TA is a Vacuum Bake / Vapor Prime system in the YES Vacuum Bake/Vapor Prime product line, with capacity for 8 cassettes of 4-inch wafers or 1 cassette of 5-8 inch wafers.
The Despatch LCD1-16NV-3 is an oven for polymer curing with nitrogen circulation, a HEPA filter, and temperature monitoring capability.
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Ion Implantation
The Applied Materials / Varian VIISta HC Ion Implant is an ion implantation system.
The Varian 350D is a medium current ion implanter that was the tool of choice for semiconductor doping in the early 1980s.
The Axcelis 6200 A is an ion implanter that accepts 6-inch wafers and supports automatic recipe loading.
The Applied Materials / Varian VIISta 810 XEri is an ion implanter described as a 12-inch medium current system.
The Applied Materials / Varian E 500 HP is an implanter described as a medium current ion implantation system for 8-inch wafers.
Wet Processing / Clean
The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The Ultratech 602 Plate Mask Cleaner is a cleaning tool designed for masks and plates in semiconductor manufacturing.
Metrology & Inspection
The Hitachi S 9200 is a scanning electron microscope (SEM) used for critical dimension (CD) measurements and wafer inspection, designed for 8-inch wafer processing.
The FEI Nova 600i (also called Nova NanoLab 600i) is a DualBeam system combining a field emission scanning electron microscope (FESEM) with a gallium focused ion beam (Ga FIB) for nanoscale prototyping, machining, characterization, and analysis of structures below 100 nm.
The Leica DM2700 M is an upright materials microscope with universal white light LED illumination designed for routine inspection tasks in metallography, earth science, forensic investigation, and materials quality control and research.
The ZEISS Axioscope 5 is a smart upright microscope designed for biomedical routine and research, featuring automatic digital documentation with a Snap button and support for multiple contrast techniques.
The Filmetrics R50 – 200 – 4PP is a metrology tool configured by default for metallic layers and sample thicknesses of 525 µm ± 25 µm.
Test & Probe
The Agilent 11729C Carrier Noise Test Set is an integral part of a phase noise measurement system, capable of up-converting, down-converting, and phase/frequency demodulation.
The Electroglas EG 6000 e is a wafer prober used in semiconductor test and probe applications.
The Keysight MSOX 4154 A is a mixed signal oscilloscope with 1.5 GHz bandwidth, 5 GSa/s sampling rate, and 4 channels.
Keysight / Agilent M 9037 A is a PXIe embedded controller.
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