Ultratech
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The Ultratech XLS 7800 is a DUV wafer stepper. The Ultratech XLS 7800 uses a 248nm laser source. The Ultratech XLS 7800 is a 4X reduction step-and-repeat exposure tool.[1][2]
A lithography stepper transfers a patterned image from a reticle to photoresist on a wafer by repeated exposure fields.
A lithography stepper sits in the patterning portion of the wafer fabrication flow between resist coating and later development, etch, or deposition transfer steps.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the XLS 7800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the XLS 7800 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the XLS 7800 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the XLS 7800 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the XLS 7800 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the XLS 7800 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 5, 2026.
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