Axcelis
The Axcelis NV 10 160 is an ion implanter designed for 3 to 6 inch wafers. The Axcelis NV 10 160 delivers a maximum implant energy of 160 keV and a beam current range of 0.5–8 mA.[1]

How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.
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The following facts about the NV 10 160 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV 10 160 Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV 10 160 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV 10 160 Ion are not on record.
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No publicly documented failure modes or field errata for the NV 10 160 Ion are on record.
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The process node or technology generation of the NV 10 160 Ion is not on record.
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Last updated Sep 24, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.