Waferpedia

Comparison ledger

0010-14300 Magnet AssyversusNV 10 160 Ion

Applied Materials 0010-14300 Magnet Assy, Axcelis NV 10 160 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
OEMApplied MaterialsAxcelis
CategoryIon ImplantationIon Implantation
Wafer size—Multiple wafer disks
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyAxcelis NV 10 160 Ion
Specifications
ConfigurationP4 Magnet Assy, IMP[1]—
Gearbox P/N0010-27417[1]—
Part Number0010-14300[1]—
DescriptionP4 Magnet Assy, IMP[1]—
Max. Implant Energy—160 keV[2]
Beam Current Range—0.5-8 mA[2]
End Station—Manual Load[2]
Automatic Wafer Handling—No AT4[2]
Source—Standard[2]
Gas Box—4 ELB Strings[2]
Vacuum—Dry Pump + Diffusion Pump[2]
Control System—Standard Console[2]
Wafer size—Multiple wafer disks[2]
Vacuum System—Dry Pump + Diffusion Pump[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing