ASML
The Twinscan XT 1950 Hi is a scanner for 12-inch wafers used for 193 nm immersion lithography with 38 nm resolution capacity. The Twinscan XT 1950 Hi has an overlay of 4 nm SMO / 7 nm MMO and a throughput of 148 wph. The Twinscan XT 1950 Hi uses a Zeiss Starlith 1950 with max NA of 1.35 or equivalent illumination system.[1][2]

Wafer size
300mm
Power
60 W / 6 khz Laser[1]
Performance
1950 Hi Additional Options[1]
Optics
38 nm Overlay: 4 nm SMO / 7 nm MMO[1]
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The throughput is 148 wph for 300 mm wafers with 125 exposures at 30 mJ.[1][2]
The following facts about the Twinscan XT 1950 Hi are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Twinscan XT 1950 Hi are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Twinscan XT 1950 Hi are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Twinscan XT 1950 Hi are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Twinscan XT 1950 Hi are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Twinscan XT 1950 Hi is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 23, 2026.
The SUSS MicroTec DSC300 Gen2 is an automated full-field scanning projection lithography system for wafers up to 300 mm.
The MA300 Gen2 is an automated mask aligner from SUSS MicroTec for proximity exposure of wafers up to 300 mm.
The JEOL JBX-9500FS Electron Beam Lithography System can load substrates from 10 mm pieces to 300 mm wafers and write features less than 10 nm in size.