Varian
Viision 200 Ion
Power
147 MHz Main & ES CPU[1]
Vacuum
Vacuum:[1]
Gas delivery
String #4 - Tylan FC 2900 (10 sccm Argon)[1]
What it is
General reference — not yet source-verifiedAn ion implanter is a semiconductor fabrication tool used to implant dopant ions into a wafer to modify its electrical properties.
Applications
General reference — not yet source-verifiedIon implanters are used for doping in the fabrication of transistors, diodes, and other semiconductor devices. Common applications include source/drain formation, threshold voltage adjustment, channel doping, and well formation in CMOS processes.
What do the numbers mean?
Power & electrical8
- Spin Amp Kollmorgen Servo Star S 700[1]
Vacuum & pumping10
- Vacuum:[1]
Wafer handling1
Gas & chemistry14
Control & software1
Configuration & options22
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Axcelis GSD 200 E 2 High Current— Same function class: Ion Implantation, nullCompare in depthsource[3]
- Applied Materials EHP 500— Same function class: Ion Implantation, nullCompare in depthsource[4]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Computer System147 MHz Main & ES CPU[1]
- String #1 - SDSMKS P 2 A (calibrated for 10 sccm phosporus)[1]
- ConfigurationString #2 - SDS Unit 1662 (calibrated for 10 sccm Arsine)[1]
- ConfigurationString #3 - HP (calibrated for 10 sccm BF 3)[1]
- ConfigurationString #4 - Tylan FC 2900 (10 sccm Argon)[1]
- PFGUnit 8160 (configured for 5 sccm Xe)[1]
- ConfigurationExternal Inert Gas Feed and Purge[1]
- ConfigurationSpin Amp Kollmorgen Servo Star S 700[1]
- ConfigurationVacuum:[1]
- Source TurboPfeiffer HiPace 1500C[1]
- Beamline TurboPfeiffer TPH 1201 U P[1]
- Endstation Manifold Turbo PumpPfeiffer HiPace 300[1]
- Cryo Compressor2x CTI 9600[1]
- Cryo Pump4x CTI 250F[1]
- Frequency Kit50 Hz[1]
- Gasbox String 1 SDSMKS P 2 A (calibrated for 10 sccm phosphorus)[1]
- Gasbox String 2 SDS Unit1662 (calibrated for 10 sccm Arsine)[1]
- Gasbox String 3 HPcalibrated for 10 sccm BF3[1]
- Gasbox String 4Tylan FC 2900 (10 sccm Argon)[1]
- Spin AmpKollmorgen Servo Star S 700[1]
- Terminal Differential PumpMembran Pump[1]
- Endstation Differential PumpMembran or Scroll Pump[1]
- Voltage208 V[2]
- Phase3 Phase[2]
- String #1 - SDSMKS-P2A: 10 sccm[2]
- String #2 - SDSMKS-P2A: 10 sccm[2]
- String #3 - HPUnit UFC-8100: 10 sccm[2]
- String #4 - HPTylan FC-2900MEP: 5 sccm[2]
- Computer147 MHz & ES CPU[2]
- Cryo Comp 19600 LV[2]
- Cryo Comp 29600 LV[2]
- Frequency50 hz Frequency Converter[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Viision 200 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Viision 200 Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Viision 200 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Viision 200 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Viision 200 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Viision 200 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
- [4]Equipment inventory listing
Last updated Sep 22, 2026.
Compare with similar tools
View all →The Applied Materials / Varian EHP 500 is an ion implanter for 6-inch wafers.
The Axcelis GSD 200 E 2 is a high current implanter with source-stated wafer sizes of 6 inch and 8 inch.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
