SUSS MicroTec
MA 6 BA 6 IR Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedA contact and proximity mask aligner brings a photomask and substrate into contact or within a small gap, then exposes the substrate through the mask with ultraviolet light.
The IR variant of the system adds infrared illumination, which passes through the substrate material and allows alignment marks on the back side of the wafer to be viewed from the front side. Back-side alignment capability permits a pattern on one face of the substrate to be registered to structures patterned on the opposite face.
Where it fits in the process flow
General reference — not yet source-verifiedThe exposure step performed by a mask aligner follows resist coating and soft baking and precedes resist developing in the lithography sequence.
Applications
General reference — not yet source-verifiedApplications for contact and proximity mask aligners include micro-electromechanical systems, compound semiconductor devices, power semiconductors, and optoelectronic components.
The back-side alignment configuration of the system is used for double-sided wafer processing, where patterns on the front side must align to patterns on the back side. The infrared illumination feature supports alignment through substrates that are not transparent to visible light.
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
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Frequently asked questions
What equipment category does the MA 6 / BA 6 IR belong to?
The MA 6 / BA 6 IR belongs to the lithography equipment category.[2]
Not publicly documented
The following facts about the MA 6 BA 6 IR Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the MA 6 BA 6 IR Mask are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 6 BA 6 IR Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 6 BA 6 IR Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 6 BA 6 IR Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 6 BA 6 IR Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]MA 6 BA 6 IR Mask — SUSS MicroTec | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Sep 29, 2026.
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