SUSS MicroTec
Alignment
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
SUSS Alignment is a SUSS MicroTec mask alignment tool line. SUSS Alignment is designed for substrates up to 300 mm. SUSS Alignment supports mask-to-wafer and wafer-to-wafer alignment.[1]
What it is
The SUSS MicroTec Alignment tool is a mask alignment system used in photolithography to align a photomask with a substrate.[4][1]
How it works
Where it fits in the process flow
Applications
Mask alignment tools are used for microscale structure fabrication in lithography applications.[4]
What do the numbers mean?
Wafer handling7
Gas & chemistry2
Optics & imaging5
Performance4
Configuration & options1
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MA300 Gen3 | Gen3 | — | Automated mask aligner platform for 300 mm and 200 mm wafers. | suss.com[1] |
| MA200 Gen3 | Gen3 | — | Automated mask aligner for wafers up to 200 mm. | suss.com[1] |
| MA12 Gen3 | Gen3 | — | Semi-automated mask alignment system for wafers up to 300 mm. | suss.com[1] |
| MJB4 | — | — | Manual system for substrates and pieces up to 100 mm. | suss.com[1] |
| MA/BA Gen4 Series | Gen4 | — | Semi-automated mask and bond aligner platform with MA/BA Gen4 and MA/BA Gen4 Pro configurations. | suss.com[1] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What substrate sizes does the SUSS MA/BA6 support?
The MA/BA6 supports substrate sizes from 1 inch to 150 mm diameter.[4]
What mask sizes does the SUSS MA/BA6 accept?
The MA/BA6 accepts mask sizes from 2.5 x 2.5 inches to 7 x 7 inches.[4]
What is the maximum substrate thickness for the SUSS MA/BA6?
The maximum substrate thickness is 10 mm.[4]
What type of resists is the SUSS MA/BA6 designed for?
The MA/BA6 is designed for use with i-line resists.[4]
What alignment modes does the SUSS MA/BA6 offer?
The MA/BA6 offers topside alignment and backside alignment.[4]
Not publicly documented
The following facts about the Alignment are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alignment are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Alignment are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alignment are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alignment is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Alignment are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]suss.com — suss.comsuss.com
- [2]waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]nff.gmu.edu — nff.gmu.edunff.gmu.edu
Last updated Oct 7, 2026.