MKS
660
The MKS 660 is a sputter deposition system for metals, alloys, and insulating thin films. The MKS 660 includes a 6-inch diameter stage. The MKS 660 supports co-sputtering and reactive sputtering.[1][2][3]
Wafer size
6-inch diameter stage
Power
2 RF power supplies[1]
Vacuum
cryo and turbo pumped to 1 x 10^7 Torr[1]
Optics
from a few nm to hundreds of nm[1]
What it is
How it works
The MKS 660 supports co-sputtering and reactive sputtering.[2]
The MKS 660 uses three three-inch diameter confocal cathodes, two RF power supplies, and a switchable DC power supply.[2]
Where it fits in the process flow
The MKS 660 can be used for liftoff deposition with sputter power.[2]
Applications
The MKS 660 is used for metals, alloys, and insulating thin films.[2][3]
The MKS 660 supports sputter deposition, co-sputtering, reactive sputtering, and liftoff deposition.[2]
- sputter deposition of metals, alloys, and insulating thin films
- liftoff deposition
- co-sputtering
- reactive sputtering
What do the numbers mean?
Power & electrical3
Vacuum & pumping3
Wafer handling3
Optics & imaging2
Configuration & options6
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Denton Vacuum Discovery 18— Same function class: Deposition, 6-inch diameter stageCompare in depthsource[4]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What materials can the MKS 660 deposit?
The MKS 660 is used for metals, alloys, and insulating thin films.[2][3]
Does the MKS 660 support reactive sputtering?
The MKS 660 supports reactive sputtering with nitrogen or oxygen.[2]
What power sources are part of the MKS 660 configuration?
The MKS 660 uses two RF power supplies and a switchable DC power supply.[2]
Can the MKS 660 be used for liftoff deposition?
The MKS 660 supports liftoff deposition with sputter power.[2]
Not publicly documented
The following facts about the 660 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 660 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 660 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 660 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 660 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 660 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]nanofab.utah.edu — nanofab.utah.edunanofab.utah.edu
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]MKS 660 family | Waferpedia — waferpedia.comwaferpedia.com
- [4]nanofab.utah.edunanofab.utah.edu
Last updated Oct 10, 2026.
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