Laurell
The Laurell WS-650-15B is a spin coater. The Laurell WS-650-15B belongs to the 650 Series. The Laurell WS-650-15B has a maximum substrate size of 300mm and a maximum speed of 12,000 rpm.[1]

The Laurell WS-650-15B is a spin coater in the 650 Series.[1]
A spin coater holds a substrate on a rotating chuck and uses controlled rotation to spread liquid uniformly across the surface.
Spin coating is commonly used to form thin, even liquid films before they are dried or otherwise processed further.
A spin coater sits in wet-process work where a liquid material must be distributed across a substrate surface before later processing.
Spin coaters are used in semiconductor, biotechnology, and nanotechnology processing.
Spin coating is used for applying uniform films from liquid materials such as photoresists and other process coatings.
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The following facts about the WS-650-15B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650-15B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the WS-650-15B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS-650-15B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS-650-15B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS-650-15B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 7, 2026.
The Laurell EDC-650-15B is an EDC System spin coater. The Laurell EDC-650-15B supports a maximum substrate size of 300 mm (9" x 9").
The Laurell EDC-HL-15 B is an EDC™ System spin coater in the 650-series. The Laurell EDC-HL-15 B accepts a maximum substrate size of 300mm (9" x 9") and reaches 12000 rpm.
The Laurell H6-15 B is a spin coater in the 650-series. The Laurell H6-15 B supports a maximum substrate size of 300mm (9" x 9") and a maximum speed of 12000 rpm.
The Laurell WS-650-15 B is a 650-series spin coater for resist processing that accommodates up to 300mm wafers and reaches 12,000 RPM.