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Headway

PWM30

Thermal / DiffusionHeadway PWM30 family
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The Headway PWM30 is a photoresist spin/bake hood. The Headway PWM30 has adjustable spin speeds from 50 to 10,000 RPM. The Headway PWM30 includes an LCD interface for user input prompts and process display.[1][2]

HeadwayPWM30
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Vacuum

Fail-safe vacuum interlocks[1]

Gas delivery

Photoresist spin/bake hood[1]

What it is

The Headway PWM30 has adjustable spin speeds from 50 to 10,000 RPM, microprocessor control, recipe storage, manual speed adjustment during a running recipe, vacuum hold-down chucks, fail-safe vacuum interlocks, bowl exhaust, removable bowl liners, and automatic dynamic braking.[1][2]

How it works

The Headway PWM30 uses vacuum hold-down chucks for alternate substrate sizes and fail-safe vacuum interlocks to secure the workpiece during spinning.[1][2]

The Headway PWM30 is microprocessor controlled, supports up to nine steps in one recipe, stores up to ten user-designed recipes, and allows speed to be manually controlled while a recipe is running.[1][2]

Applications

The Headway PWM30 is used for photoresist coating on samples that fit the selected vacuum hold-down chuck.[1][2]

  • Photoresist coating

What do the numbers mean?

Vacuum & pumping3

Substrate support
Vacuum hold down chucks for alternate substrate sizes[1]
Accurate?
Safety
Fail-safe vacuum interlocks[1]
Accurate?
Exhaust
Bowl exhaust[1]
Accurate?

Gas & chemistry1

Type
Photoresist spin/bake hood[1]
Accurate?

Control & software4

Control
Microprocessor controlled[1]
Accurate?
Recipe steps
Supports up to nine steps in one recipe[1]
Accurate?
Recipe storage
Stores up to 10 user-designed recipes[1]
Accurate?
User interface
LCD interface for user input prompts and process display[1]
Accurate?

Configuration & options3

Spin speed
50-10,000 RPM[1]
Accurate?
Bowl
Removable bowl liners[1]
Accurate?
Braking
Automatic dynamic breaking[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • TypePhotoresist spin/bake hood[1]
  • Substrate supportVacuum hold down chucks for alternate substrate sizes[1]
  • SafetyFail-safe vacuum interlocks[1]
  • ExhaustBowl exhaust[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What speed range does the Headway PWM30 support?

The Headway PWM30 supports adjustable spin speeds from 50 to 10,000 RPM.[1][2]

How many recipe steps can the Headway PWM30 support?

The Headway PWM30 supports up to nine steps in one recipe.[1][2]

How many user-designed recipes can the Headway PWM30 store?

The Headway PWM30 stores up to ten user-designed recipes.[1][2]

What substrate holding features does the Headway PWM30 use?

The Headway PWM30 uses vacuum hold-down chucks for alternate substrate sizes and fail-safe vacuum interlocks.[1][2]

Not publicly documented

The following facts about the PWM30 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PWM30 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the PWM30 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the PWM30 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the PWM30 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the PWM30 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]nanocenter.umd.edu — nanocenter.umd.edunanocenter.umd.edu
  2. [2]https://www.nanocenter.umd.edu/equipment/fablab/sops/photo-09/Photo-09%20-%20SOP%20-%20Photoresist%20Spin%20Station.pdf — nanocenter.umd.edunanocenter.umd.edu
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Last updated Oct 9, 2026.

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