Bruker

An AFM operates by raster-scanning a sharp tip mounted on a flexible cantilever across the sample surface while a feedback loop maintains constant tip-sample interaction, typically constant force in contact mode or constant oscillation amplitude in tapping mode.
The deflection of the cantilever is measured using a laser beam reflected off the cantilever onto a photodetector, producing a three-dimensional topographic map of the surface.
Atomic force microscopes are used in semiconductor fabrication for offline or inline metrology, providing high-resolution measurements of surface roughness, step heights, line widths, and other topographical features at the nanoscale.
The Dimension 3100 supports multiple imaging modes including conductive AFM (CAFM) and extended tunneling AFM (TUNA) through dedicated application modules.[2]
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the Dimension 3100 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Dimension 3100 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Dimension 3100 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Dimension 3100 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Dimension 3100 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Dimension 3100 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 3, 2026.
The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.