Applied Materials
PI 9500 Ion
The Applied Materials PI 9500 Ion Implanter is an ion implanter. The Applied Materials PI 9500 Ion Implanter is specified for 6 inch wafers. The Applied Materials PI 9500 Ion Implanter includes a variable 0-7 degree tilt angle.[1]
Wafer size
Wafer Loader Blade Control PCB
Power
60 Hz[1]
Vacuum
Leybold Turbo pumps[1]
Gas delivery
Boron (gas module missing)[1]
What it is
The Applied Materials PI 9500 Ion is an ion implanter for semiconductor manufacturing.[1]
How it works
Where it fits in the process flow
The Applied Materials PI 9500 Ion is arranged for through-wall layout with top-feed utilities and remote operation through a six-meter umbilical.[1]
Applications
General reference — not yet source-verifiedIon implantation is used to form doped regions in semiconductor devices and to tune conductivity near the wafer surface.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Rear cryo compressor missing
- Wafer Loader Blade Control PCB missing
- Spin Control PCB missing
- Spin/Scan Control PCB missing
- MRS turbo missing
- PFG Argon feed through missing
- Rear Cryo missing
- Spin Motor gear/coupler missing
- Blade carriage bearing arm missing
- Front monitor missing
- Isolation Transformer Breaker (term PD) missing
- Scan arm work missing
- PFG Filament PSU missing
- Filament PSU missing
- Beam stop Shield Interlock switch missing
- Wheel Index PCB (Wheel Chamber) missing
- Two Wheel chamber Plexiglas windows missing
- Wafer on Blade sensor missing
- Fast Wheel Index Sensor missing
- Gas Modules missing
- TFT monitor upgrade missing
What do the numbers mean?
Power & electrical3
- Ebara A07V Mech pump[1]
Vacuum & pumping2
Wafer handling4
Gas & chemistry4
Control & software1
Configuration & options21
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Frequency60 Hz[1]
- ConfigurationLeybold Turbo pumps[1]
- ConfigurationEbara A07V Mech pump[1]
- ConfigurationCTI Cryo pump, rear cryo compressor missing, 9600 model[1]
- PumpsLeybold Turbo pumps; Ebara A07V Mech pump; CTI Cryo pump[1]
- Gas position 1Boron (gas module missing)[1]
- Gas position 2n/a (gas module missing)[1]
- Gas position 3Phosphine[1]
- Gas position 4Arsine[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the PI 9500 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PI 9500 Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PI 9500 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PI 9500 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PI 9500 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PI 9500 Ion are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Oct 5, 2026.
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