Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec DSC500, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | DSC500SUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | 450 x 500 mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec DSC500 |
| Specifications | ||
| Substrate size | — | up to 450 x 500 mm[1] |
| Type | — | Projection Lithography[1] |
| Automation | — | Automated system[1] |
| Exposure method | — | Full-Field Scanning Projection[1] |
| Alignment | — | Included[1] |
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