SUSS MicroTec
The DSC500 is an automated projection lithography system from SUSS MicroTec. The DSC500 provides full-field scanning projection exposure for substrates up to 450 x 500 mm. The DSC500 includes alignment capability.[1]
In semiconductor and micro-device manufacturing, the DSC500 is positioned in the lithography step, where it patterns a photoresist layer on the substrate.
The lithography step is typically preceded by coating a photoresist and followed by developing, etching, or other pattern-transfer processes.
The DSC500 is applicable in microstructuring for markets such as semiconductors, MEMS, and advanced packaging, where high-resolution patterning on large substrates is required.
The system can be used for processes like redistribution layer patterning and other large-area lithography tasks in advanced packaging.
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The following facts about the DSC500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the DSC500 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the DSC500 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the DSC500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the DSC500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the DSC500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 22, 2026.
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