Comparison ledger
Axcelis NV 10 160 Ion, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NV 10 160 IonAxcelis | 160 XP IonVarian |
|---|---|---|
| OEM | Axcelis | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Multiple wafer disks | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV 10 160 Ion | Varian 160 XP Ion |
| Specifications | ||
| Max. Implant Energy | 160 keV[1] | — |
| Beam Current Range | 0.5-8 mA[1] | — |
| End Station | Manual Load[1] | — |
| Automatic Wafer Handling | No AT4[1] | — |
| Source | Standard[1] | — |
| Gas Box | 4 ELB Strings[1] | — |
| Vacuum | Dry Pump + Diffusion Pump[1] | — |
| Control System | Standard Console[1] | — |
| Wafer size | Multiple wafer disks[1] | — |
| Vacuum System | Dry Pump + Diffusion Pump[1] | — |
| Configuration | — | 150mm High Current IMP[2] |
| OEM | — | Varian[3] |
| Model | — | 160 XP Ion[3] |
| Category | — | Ion Implantation[2] |
| Tool type | — | ion implanter[2] |
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