Comparison ledger
SUSS MicroTec MA1006, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA1006SUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MA1006 | Ultratech 1000 Family |
| Cited variants | — | |
| Specifications | ||
| OEM | SUSS MicroTec[3] | — |
| Model | MA1006[3] | — |
| Tool category on source page | Step Height PROFILOMETER[3] | — |
| Resolution | 1 micron on 6-inch wafers[4] | — |
| Measured linewidth | 2 µm at full photoresist height (Shipley 1813 process)[5] | — |
| Wafer size | up to 150mm diameter[2] | — |
| Mask size | maximum 7" x 7"[2] | — |
| Exposure modes | Proximity, soft, hard, vacuum contact[2] | — |
| Exposure optics | UV400: 350-450nm; UV300: 280-350nm; Hg-lamp 350W or 1000W[2] | — |
| Exposure uniformity | ±5% typical for 150mm wafer[2] | — |
| Alignment step | 1μm steps[2] | — |
| Soft contact pressure | 2-8 N[2] | — |
| Hard contact pressure | Nitrogen pressure 0-2 bar[2] | — |
| Vacuum contact level | < -0.8 bar[2] | — |
| Dimensions (W×H×D) | ca. 920mm × 1600mm × 870mm[2] | — |
| Weight | ca. 450 kg[2] | — |
| Power requirement | 350W lamp: 1200 VA; 1000W lamp: 2000 VA[2] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[6] |
| Optical design | — | Wynne Dyson[6] |
| Magnification | — | 1X[6] |
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