Comparison ledger
Axcelis 200 ACU, Lam Research 2300 Kiyo EX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | 2300 Kiyo EXLam Research |
|---|---|---|
| OEM | Axcelis | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Lam Research 2300 |
| Specifications | ||
| Configuration | Parts Machine[1] | Polysilicon[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | 2300 Kiyo EX[5] |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | Etch/Ash/Clean - Plasma Processing Equipment[6] |
| Wafer configuration | 8 inch[2] | — |
| OEM | — | Lam Research[5] |
| Description | — | Polysilicon Etch[6] |
| Currently configured for | — | 300 mm[6] |
| Tool model | — | KIYOEX[6] |
| System power rating | — | 208 AC 3-Phase[6] |
| Loading configuration | — | 3 Load ports[6] |
| Chambers | — | Chamber 1, Chamber 2, Chamber 3[6] |
| Chamber descriptions | — | KIYOEX, KIYOEX, KIYOEX[6] |
| Process Type | — | Polysilicon Etch[6] |
| Wafer Size | — | 300mm[6] |
| Load Ports | — | 3[6] |
| Chamber Type | — | KIYOEX[6] |
| N2 Load Port Vendor | — | JUSTEM[6] |
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