Comparison ledger
Applied Materials 0010 47763, Plasma-Therm SLR 770 ICP Deep Silicon, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | SLR 770 ICP Deep SiliconPlasma-Therm |
|---|---|---|
| OEM | Applied Materials | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Plasma-Therm SLR 770 |
| Specifications | ||
| Configuration | 2nd Source New[1] | Load lock shuttle lock transfer[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | SLR 770[4] |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | Deep silicon etch[6] |
| Quantity available (source) | 1[2] | — |
| Process Gas | — | O2, Ar, SF6, C4F6[4] |
| Chiller | — | Neslab HX300[4] |
| Power Box | — | Square D[4] |
| Manufacturer | — | Plasma-Therm[4] |
| Category | — | Etch[4] |
| Wafer sizes | — | 4 inch[4] |
| Tool type | — | Single-chamber inductively coupled plasma etcher[5] |
| Wafer handling | — | Load lock shuttle lock transfer[4] |
| Load lock | — | Single wafer semi-auto load lock[6] |
| Gas box | — | Horiba SEC-E40 (4)[4] |
| Process gases | — | O2, Ar, SF6, C4F6[4] |
| Controller and RF generator | — | RF Power Products RFPP I22050001 & I20050007[4] |
| Adaptive pressure controller | — | VAT PM-5[4] |
| Heater controller | — | Plasmatherm PC OS[4] |
| RF generator | — | RF Power Products RFPP RF5S & AM-5[4] |
| Turbo pump and controller | — | Leybold MAG 2000; Leybold MD 2000[4] |
| Vintage | — | 01.06.1998[6] |
| Power | — | 1.0 kW ICP RF package; 2 kW generator limited to 1.0 kW; 500 W RF bias[6] |
| Gas box lines | — | 5 lines[6] |
| Additional process gases | — | CHF3, C4F8, SF6, Ar, O2[6] |
| Dry pump | — | Edwards ih80[6] |
| Load lock dry pump | — | Edwards nxds[6] |
| Load lock turbo pump | — | Leybold[6] |
| Turbo pump | — | Edwards STPA-1303CV[6] |
| Electrical | — | 380VAC 3 phase[6] |
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