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Comparison ledger

0010-16392 ESC Assemblyversus2300 Kiyo EX

Applied Materials 0010-16392 ESC Assembly, Lam Research 2300 Kiyo EX, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
2300 Kiyo EXLam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyLam Research 2300
Specifications
OEMApplied Materials[1]Lam Research[3]
Model0010-16392[1]2300 Kiyo EX[3]
TypeESC Assembly[1]—
Wafer Size300 mm[2]300mm[4]
Electrode ConfigurationDual[2]—
Configuration—Polysilicon[3]
Description—Polysilicon Etch[4]
Equipment type—Etch/Ash/Clean - Plasma Processing Equipment[4]
Currently configured for—300 mm[4]
Tool model—KIYOEX[4]
System power rating—208 AC 3-Phase[4]
Loading configuration—3 Load ports[4]
Chambers—Chamber 1, Chamber 2, Chamber 3[4]
Chamber descriptions—KIYOEX, KIYOEX, KIYOEX[4]
Process Type—Polysilicon Etch[4]
Load Ports—3[4]
Chamber Type—KIYOEX[4]
N2 Load Port Vendor—JUSTEM[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]macquarie.commacquarie.com