Veeco
K 465 GaN MOCVD
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Veeco K 465 GaN MOCVD is a metal organic chemical vapor deposition system for GaN. The K 465 GaN MOCVD uses a K465 GaN Turbo disk. The K 465 GaN MOCVD operates on a 3 phase, 5 wire, 380 Vac, 280 A, 50/60 Hz power supply.[1][2]
What it is
The Veeco K 465 is a GaN MOCVD system for metal organic chemical vapor deposition.[1]
How it works
General reference — not yet source-verifiedA metal organic chemical vapor deposition system delivers reactive precursor gases into a process chamber and forms thin semiconductor films on a heated substrate by chemical reaction at the surface.
A GaN MOCVD tool is used to grow gallium nitride epitaxial layers with controlled composition and thickness for device structures.
Where it fits in the process flow
General reference — not yet source-verifiedA metal organic chemical vapor deposition system sits in the epitaxial growth stage of compound semiconductor fabrication.
Applications
General reference — not yet source-verifiedGaN epitaxy supports compound semiconductor device fabrication for electronic and optoelectronic structures.
What do the numbers mean?
Power & electrical3
Vacuum & pumping1
- K465 GaN Turbo disk[1]
Configuration & options2
- Vintage
- 2010 (asset 151584), 2010 (asset 151583), 2010 (asset 151582), 2009 (asset 151581), 2009 (asset 151580)[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the K 465 GaN MOCVD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the K 465 GaN MOCVD are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the K 465 GaN MOCVD are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the K 465 GaN MOCVD are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the K 465 GaN MOCVD are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the K 465 GaN MOCVD is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Equipment inventory listing
- [3]Inventory photo
- [4]Inventory photo
- [5]Equipment inventory listing
- [6]VEECO - Solutions for a nanoscale world — veeco.com (Jan 26, 2008)web.archive.org
Last updated Oct 8, 2026.
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