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Veeco

AP 300 E Lithography

LithographyWarped Wafer Handling to 500 umVeeco AP 300 E Lithography family
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The Veeco AP 300 E Lithography System is a lithography tool. The Veeco AP 300 E Lithography System has 2.0 µm resolution. The Veeco AP 300 E Lithography System supports warped wafer handling to 500 µm.[1][2][3]

Veeco logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Wafer size

Warped Wafer Handling to 500 um

Power

208 V three phase, 5 wire, 150 amp[1]

Performance

PATMAX MVS Alignment System[1]

Optics

MVS Alignment Spectrum of 530 - 570 nm[1]

Where it fits in the process flow

Configuration options indicate use in advanced packaging flows, including three-dimensional packaging and generation four fan-out on three hundred millimeter wafers. The system supports step-specific processing, multi-zone enhanced global alignment, and grid focus routines.[1][2]

Applications

The system supports both two hundred millimeter and three hundred millimeter wafer sizes, and its extended-field ghi-line broadband optics enable imaging for thick photoresist layers and substrates with significant topography.[1][2]

What do the numbers mean?

Power & electrical3

2.0 um Resolution, Extended Field, ghi-line Broadband Lens Dual 1200 Watt Lamp llluminator[1]
Accurate?
Power Source
208 V three phase, 5 wire, 150 amp[1]
Accurate?
Illuminator
Dual 1200 Watt Lamp Illuminator[1]
Accurate?

Wafer handling13

Universal Size/Warped Wafer Kit
200 mm and 300 mm[1]
Accurate?
Wafer size
Warped Wafer Handling to 500 um[1]
Accurate?
Wafer size
FOUP Wafer Handling[1]
Accurate?
Wafer size
Wafer Thickness Handling from 0.4 mm to 2.0 mm PATMAX MVS Alignment System[1]
Accurate?
Open Cassette Adapter (QTY 2)[1]
Accurate?
Wafer size
200 mm and 300 mm[1]
Accurate?
Warped wafer handling
to 500 um[1]
Accurate?
Wafer handling
Universal Size/Warped Wafer Kit: 200 mm and 300 mm[1]
Accurate?
Wafer handling
FOUP wafer handling[1]
Accurate?
Wafer thickness handling
0.4 mm to 2.0 mm[1]
Accurate?
Open cassette adapter
QTY 2[1]
Accurate?
Wafer size
Configuration Options - Wafer Handling:[1]
Accurate?
Gen 4 Fanout 300
300mm wafer size only[1]
Accurate?

Optics & imaging14

Lens Distortion Reference - No lens matching - Closed Loop Cooler[1]
Accurate?
Lens Protection (Requires Closed Loop Cooler)[1]
Accurate?
MVS Alignment Spectrum of 530 - 570 nm[1]
Accurate?
6 Slot Reticle Stack, Manual Front Loading[1]
Accurate?
6 x 6 x 0.25 inch Reticle Type[1]
Accurate?
Edge Exposure System (WEE 3)[1]
Accurate?
Resolution
2.0 µm[1]
Accurate?
Optics
extended-field, ghi-line broadband lens[1]
Accurate?
MVS alignment spectrum
530 - 570 nm[1]
Accurate?
Reticle stack
6 slot, manual front loading[1]
Accurate?
Reticle type
6 x 6 x 0.25 inch[1]
Accurate?
Edge exposure system
WEE 3[1]
Accurate?
Lens protection
requires closed loop cooler[1]
Accurate?
Lens distortion reference
no lens matching[1]
Accurate?

Performance1

Alignment system
PATMAX MVS Alignment System[1]
Accurate?

Dimensions & facilities2

Edge Exclusion System with one Exclusion Ring Specify exclusion ring width 1 - 5 mm protection available[1]
Accurate?
Edge exclusion system
one exclusion ring; exclusion ring width 1 - 5 mm protection available[1]
Accurate?

Configuration & options12

68 x 26 mm Field Size[1]
Accurate?
Dual Flip Aperture
([68mm/44mm/34.2mm] x 26mm)[1]
Accurate?
Enhanced Bottom Pellicle[1]
Accurate?
Environmental Chamber, Shipped From Supplier (White)[1]
Accurate?
GEM HSMS Communications[1]
Accurate?
ghi-line Auto Filter Changer[1]
Accurate?
Field size
68 x 26 mm[1]
Accurate?
Communications
GEM HSMS[1]
Accurate?
Auto filter changer
ghi-line auto filter changer[1]
Accurate?
Environmental chamber
shipped from supplier (white)[1]
Accurate?
Closed loop cooler
included[1]
Accurate?
Enhanced bottom pellicle
included[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Configuration2.0 um Resolution, Extended Field, ghi-line Broadband Lens Dual 1200 Watt Lamp llluminator[1]
  • Power Source208 V three phase, 5 wire, 150 amp[1]
  • IlluminatorDual 1200 Watt Lamp Illuminator[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What resolution does the AP 300 E Lithography System support?

The AP 300 E Lithography System has 2.0 µm resolution.[1][2][3]

What wafer sizes does the AP 300 E Lithography System support?

The AP 300 E Lithography System supports 200 mm and 300 mm wafers.[1][2]

How much wafer warpage can the AP 300 E Lithography System handle?

The AP 300 E Lithography System supports warped wafer handling to 500 µm.[1][2][3]

What alignment system does the AP 300 E Lithography System use?

The AP 300 E Lithography System uses a PATMAX MVS Alignment System.[1][2]

What packaging flows are indicated for the AP 300 E Lithography System?

The AP 300 E Lithography System includes configuration options for three-dimensional packaging and generation four fan-out on 300 mm wafers.[2][1]

Not publicly documented

The following facts about the AP 300 E Lithography are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AP 300 E Lithography are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the AP 300 E Lithography are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the AP 300 E Lithography are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the AP 300 E Lithography are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the AP 300 E Lithography is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]AP 300 E Lithography — Veeco | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  3. [3]Veeco AP 300 E Lithography family | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 5, 2026.

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