Varian
EHPI E 220
What it is
The Varian EHPI E 220 is an ion implantation system for semiconductor wafer processing. The EHPI E 220 is a medium-current implanter that handles 200 mm (8 inch) wafers. The system includes a SMIF interface implemented as a Varian interface for Brooks SMIFS. The machine operates on three-phase 208 V line voltage at 50/60 Hz line frequency.[1][2]
How it works
The EHPI E 220 uses a cryopump on board for vacuum generation. The system provides two chambers. The process chamber, designated Chamber A, is constructed in DPN aluminum. Gas delivery is handled by a gas box with 4 sticks, with HP and SDS 2 in use. The machine includes a transfer chamber and uses an optical sensor for wafer mapping. The cassette stage accepts 200 mm (8 inch) wafers as standard. A UPS of the CVCS type conditions the incoming power. The system uses a heat-exchange chiller and a DI cart with B-Pure filters. The status light tower uses red, orange, and green lamps.[1][2]
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is used to introduce dopant atoms into defined regions of a semiconductor wafer to control electrical conductivity. The step typically follows photolithographic patterning, which defines the areas to be doped. Medium-current implanters serve applications that require a precise, controllable dose and good energy accuracy. After implantation, wafers are annealed to activate the dopant and repair lattice damage.
Applications
General reference — not yet source-verifiedIon implanters are used to dope silicon wafers in the fabrication of integrated circuits. Medium-current implanters are applied to implant steps such as threshold-voltage adjustment, well formation, and channel-stop doping. The energy and dose control of this class suits it to shallow and moderately deep implants in front-end processing.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Not working
- Missing Tplm Board & Platen
What do the numbers mean?
Power & electrical2
Vacuum & pumping3
- Pump Options:[1]
Wafer handling5
Gas & chemistry3
Control & software2
Configuration & options13
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Applied Materials VIISta 810 XEri— Same function class: Ion Implantation, nullCompare in depthsource[3]
- Applied Materials VIISta 810— Same function class: Ion Implantation, nullCompare in depthsource[4]
- Applied Materials EHP 500— Same function class: Ion Implantation, nullCompare in depthsource[5]
- Applied Materials E 500 HP— Same function class: Ion Implantation, nullCompare in depthsource[6]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the EHPI E 220 handle?
The EHPI E 220 uses a cassette stage for 200 mm (8 inch) wafers as standard.[1][2]
What are the electrical requirements of the EHPI E 220?
The EHPI E 220 operates on three-phase 208 V supply at 50/60 Hz line frequency.[1][2]
What type of SMIF interface does the EHPI E 220 have?
The EHPI E 220 has a SMIF interface implemented as a Varian interface for Brooks SMIFS.[1][2]
Is the EHPI E 220 a medium-current or high-current implanter?
Not publicly documented
The following facts about the EHPI E 220 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EHPI E 220 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EHPI E 220 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EHPI E 220 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the EHPI E 220 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the EHPI E 220 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Equipment inventory listing
- [4]waferpedia.comwaferpedia.com
- [5]Equipment inventory listing
- [6]Equipment inventory listing
Last updated Sep 25, 2026.
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