Ultratech
Provisional entry — research in progress
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The Ultratech 1700 is a stepper used for lithography in thin film head and semiconductor processes. The Ultratech 1700 is specified for 1 μm resolution in typical thin film head processes.[1]
Plate 01Robitic loader on Ultratech stepper model 1700, side view top cover off
Plate 021700 MVS (SN1119) Demo Video
Plate 03Ultratech Stepper 1700 (SN 874) Demo Video
In a typical thin film head lift-off process, the Ultratech 1700 is used to expose an imaging resist over a LOL1000 underlayer. The process includes no post-exposure bake and uses a specific developer.[1]
Process applications and technology nodes documented for this tool.
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The following facts about the 1700 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the 1700 are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1700 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 1700 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 1700 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 1700 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Oct 9, 2026.
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