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Tokyo Electron

Alpha 303 i

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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What it is

General reference — not yet source-verified

The Tokyo Electron Alpha 303 i is a furnace used in semiconductor manufacturing.

How it works

General reference — not yet source-verified

A furnace in this class heats wafers in a controlled thermal environment to change material properties or drive dopants into silicon.

Diffusion furnaces process multiple wafers together in batch form rather than treating each wafer as a single discrete exposure step.

Where it fits in the process flow

General reference — not yet source-verified

A thermal diffusion furnace belongs in the front-end or mid-process thermal sequence, where high-temperature steps support oxidation, diffusion, anneal, nitride-related treatment, and related wafer conditioning.

Applications

General reference — not yet source-verified

Furnaces of this class are used for thermal steps that modify films, activate dopants, and alter the electrical behavior of semiconductor layers.

What do the numbers mean?

Configuration & options9

K type / Mto[1]
Accurate?
Nitride[2]
Accurate?
Anneal, PIQ, D-Poly, NIT, Alloy[3]
Accurate?
Type
Furnace[1]
Accurate?
Process applications
Anneal, PIQ, D-Poly, NIT, Alloy[3]
Accurate?
Process type
Nitride[2]
Accurate?
Process type
K type[1]
Accurate?
Vintage year
2005[1]
Accurate?
Vintage year
2009[3]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Nitride—2005—Equipment inventory listing[2]
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the Alpha 303 i?

The Alpha 303 i is a furnace.[1][4][5][2][3]

Not publicly documented

The following facts about the Alpha 303 i are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 303 i are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Alpha 303 i are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Alpha 303 i are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Alpha 303 i is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Alpha 303 i are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]Equipment inventory listing
  5. [5]Equipment inventory listing
  6. [6]Equipment inventory listing
  7. [7]Thermal Processing | Tokyo Electron — tel.com (Jun 21, 2012)web.archive.org
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Last updated Oct 8, 2026.

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