SUSS MicroTec
Labspin 6 Photoresist Spinner
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The SUSS MicroTec Labspin 6 Photoresist Spinner is a manual photoresist spin coater for semiconductor lithography work.[3]
The Labspin 6 is a spin-coating and developer platform in the LabSpin family, and the LabSpin 6 configuration is given for up to four inch round or square substrates.[2][1]
How it works
The Labspin 6 uses a touch-panel graphical interface, programmable recipe steps, automatic vacuum control, a closed-cover interlock, and an internal vacuum source for the chuck.[2]
The LabSpin platform can also support dispense, edge coating, edge bead removal, puddle develop, and nitrogen drying functions through optional process hardware.[2]
Applications
The Labspin 6 is used for photoresist coating and related resist-processing operations on wafers.[3]
What do the numbers mean?
Wafer handling3
Gas & chemistry2
Control & software2
Configuration & options6
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What process functions are available on the Labspin platform?
The Labspin platform supports spin coating, puddle developing, drying, edge coating, and edge bead removal.[2]
What control and recipe features does the Labspin 6 include?
The Labspin 6 includes a touch panel with color display, up to 200 recipes, up to 40 process steps, and programmable step times from 1 to 999 seconds.[2]
What chuck speed and acceleration are specified for the Labspin 6 platform?
The platform specifies a maximum spin speed of 8,000 rpm with a 200 mm chuck and a maximum acceleration of 4,000 rpm per second.[2]
Not publicly documented
The following facts about the Labspin 6 Photoresist Spinner are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Labspin 6 Photoresist Spinner are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Labspin 6 Photoresist Spinner are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Labspin 6 Photoresist Spinner are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Labspin 6 Photoresist Spinner is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Labspin 6 Photoresist Spinner are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]coltronics.com.au — coltronics.com.aucoltronics.com.au
- [3]Suss Labspin 6 Photoresist Spinner - Semiconductor Nanofabrication Laboratory - Confluence — rit-its.atlassian.netrit-its.atlassian.net
Last updated Oct 7, 2026.
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