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Oxford Instruments

Ionfab 300 Plus IBD

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

Ionfab 300 Plus IBD — Inventory photo
Fig. 01Ionfab 300 Plus IBDInventory photo[1]

What it is

The Oxford Instruments Ionfab 300 Plus IBD is an ion beam deposition system. Ion beam deposition systems use a beam of energetic ions to sputter material from a target onto a substrate, forming a thin film. The Ionfab 300 Plus IBD is part of the Oxford Instruments Ionfab 300 family. The system handles wafers with diameters of 6-inch to 8-inch. The Ionfab 300 Plus IBD is a deposition tool that processes wafers in a vacuum environment.[3][4]

How it works

The Ionfab 300 Plus IBD generates an ion beam using DC hot wire filament ion guns. The ion beam strikes a target material, ejecting atoms that deposit onto the substrate. The substrate is held on a planetary motion system, which provides uniform coating. Film thickness is monitored with a quartz crystal microbalance (QCM). The system includes a loadlock with a robot and secondary pumping, allowing the vacuum to be maintained inside the deposition chamber for higher throughput.[4][3]

Applications

General reference — not yet source-verified

Ion beam deposition systems like the Ionfab 300 Plus IBD are used for a variety of thin film applications. Common applications include optical coatings, such as anti-reflective coatings and dielectric mirrors. The process is also used for magnetic films in sensor and memory devices, as well as for hard coatings and barrier layers in microelectromechanical systems (MEMS). The ability to deposit high-quality films at low temperatures makes ion beam deposition suitable for compound semiconductor devices and optoelectronic components.

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • No longer functioning
  • Software, Automata

What do the numbers mean?

Power & electrical1

Electrical supply
3 Phase[3]
Accurate?

Vacuum & pumping1

Wafer handling / throughput configuration
Loadlock and robot with secondary pumping; vacuum can remain inside for higher throughput[3]
Accurate?

Wafer handling1

Wafer size
6-inch to 8-inch wafers[3]
Accurate?

Control & software2

No longer Functioning
Software, Automata[1]
Accurate?
Functional status (as reported on one unit)
No longer functioning: Software, Automata[1]
Accurate?

Configuration & options5

Contamination
II-VI[1]
Accurate?
Category
Deposition[2]
Accurate?
Family
Oxford Instruments Ionfab 300[2]
Accurate?
Process type (IBD/IBE configuration)
Ion beam deposition and ion beam etching[3]
Accurate?
Vintage
2013[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Ionfab 300 Plus IBD / IBE——Combined ion beam deposition and ion beam etching configuration for 6-inch to 8-inch waferswaferpedia.com[3]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Wafer handling / throughput configurationLoadlock and robot with secondary pumping; vacuum can remain inside for higher throughput[3]
  • Electrical supply3 Phase[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What wafer sizes does the Ionfab 300 Plus IBD support?

The system handles wafers with diameters of 6-inch to 8-inch.[3]

What type of ion source is used in the Ionfab 300 Plus IBD?

The system uses DC hot wire filament ion guns.[4]

How is film thickness monitored during deposition?

Film thickness is monitored using a quartz crystal microbalance (QCM).[4]

Does the Ionfab 300 Plus IBD have a loadlock?

Yes, it includes a loadlock with a robot and secondary pumping to maintain vacuum.[3]

Not publicly documented

The following facts about the Ionfab 300 Plus IBD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Ionfab 300 Plus IBD are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Ionfab 300 Plus IBD are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the Ionfab 300 Plus IBD is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Ionfab 300 Plus IBD are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the Ionfab 300 Plus IBD are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.com — waferpedia.comwaferpedia.com
  4. [4]Oxford Instruments Ion Beam vs Oxford Instruments Ionfab 300 Plus IBD comparison | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 10, 2026.

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