Nikon
SF 130
The Nikon SF 130 is a lithography stepper. The Nikon SF 130 uses an i-line exposure wavelength of 365 nm. The Nikon SF 130 supports 200 mm wafer exposure.[1][2]
What it is
Where it fits in the process flow
General reference — not yet source-verifiedA lithography stepper sits in the front end of wafer patterning, after resist coating and before downstream pattern transfer steps such as etch or implantation.
Applications
The Nikon SF 130 is used for semiconductor photolithography on wafers.[3][8][1][4]
What do the numbers mean?
Power & electrical2
Wafer handling3
- Loader chamber[3]
Optics & imaging3
Control & software4
Configuration & options16
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Canon FPA 5510 iZ i-Line— Same function class: Lithography, nullCompare in depthsource[5]
- Canon FPA 5500 iZa i-Line— Same function class: Lithography, nullCompare in depthsource[6]
- Canon FPA 3000 i 5 ++ i-Line— Same function class: Lithography, nullCompare in depthsource[7]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Why is alignment important in this class of machine?General reference — not yet source-verified
Alignment ensures that each new pattern lands in the correct position relative to previously formed structures.
Is this class limited to semiconductor manufacturing?General reference — not yet source-verified
No. The same basic class of machine is also used in other precision patterning applications that require accurate image transfer to a substrate.
Not publicly documented
The following facts about the SF 130 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SF 130 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SF 130 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SF 130 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SF 130 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SF 130 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]Inventory photo
- [4]fab-spares.com — fab-spares.comfab-spares.com
- [5]Equipment inventory listing
- [6]Equipment inventory listing
- [7]Equipment inventory listing
- [8]Equipment inventory listing
Last updated Oct 5, 2026.
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The Canon FPA 3000 i 5 ++ is an i-line stepper designed for 8-inch wafers.
The Canon FPA 5500 iZa is an i-line stepper lithography system for 8-inch wafers.
The Canon FPA 5510 iZ is an i-line stepper for 12-inch wafer processing.