Nikon

S 306 C

Research Quality: 40% complete

The Nikon S 306 C is a lens-based 193 nm ArF scanner. The Nikon S 306 C uses a 0.78 numerical aperture lens. The Nikon S 306 C is a 1:4 reduction system.^[1]^[2]

S 306 C — Inventory photo — Fig. 01S 306 CInventory photo^[3]

What it is

The Nikon S 306 C is a deep-ultraviolet (DUV) step-and-scan lithography system (scanner) designed for semiconductor manufacturing. Nikon announced the system in June 2001, positioning it as a fourth-generation 193 nm scanner for 100 nm design rules.^[3]^[2]^[1]

How it works

The maximum exposure field of the S 306 C is 25 × 33 mm. Overlay accuracy (EGA, |M| + 3σ) is specified as ≤ 20 nm, and three-sigma alignment accuracy is better than 23 nm. Throughput exceeds 135 wafers per hour on 200 mm wafers and more than 85 wafers per hour on 300 mm wafers.^[2]^[1]

What do the numbers mean?

Wafer handling4

Throughput: 135 – 200 wafers per hour (200 mm) / over 85 wafers per hour (300 mm)^[1]
Wafer size: 8 inch (200 mm) and 300 mm^[3]
Wafer size: 8 inch^[3]
Throughput: more than 135 - 200 mm wafers per hour and over 85 - 300 mm wafers per hour^[1]

Optics & imaging17

Arf Wavelength: 193 nm^[3]; Resolution ≤ 100 nm^[2]; Exposure source ArF excimer laser (193 nm wavelength)^[2]
Reduction magnification 1: 4^[2]; Maximum exposure range 25 × 33 mm^[2]; Overlap accuracy (EGA, |M| + 3σ) ≤ 20 nm^[2]
Resolution: ≤ 100 nm (with SHRINC)^[2]
Resolution (without SHRINC): 120 nm^[1]
Numerical Aperture (NA): 0.78^[2]
Exposure source: ArF excimer laser (193 nm)^[2]
Reduction magnification: 1:4^[2]
Maximum exposure range: 25 × 33 mm^[2]
Overlap accuracy (EGA, |M| + 3σ): ≤ 20 nm^[2]
Alignment accuracy (three-sigma): better than 23 nm^[1]
Exposure source: ArF excimer laser (193 nm wavelength)^[2]
Resolution: ≤ 100 nm^[2]
Alignment accuracy: better than 23 nm^[1]

Configuration & options5

NA 0.78^[2]
Type: Scanner^[3]
Make: Nikon^[3]
Model: S 306 C^[3]
NA: 0.78^[2]

Vintage & configurations

2002orders accepted^[1]
Nikon stated it would begin accepting orders for the S306C in spring 2002.

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Not publicly documented

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Frequently asked questions

What exposure wavelength does the Nikon S 306 C use?

The System uses an argon fluoride (ArF) excimer laser with a wavelength of 193 nm.^[3]^[2]^[1]

What is the numerical aperture (NA) of the lens?

The lens has a numerical aperture of 0.78.^[2]^[1]

What resolution can the S 306 C achieve?

Native resolution is 120 nm, and with Nikon's SHRINC enhancement it reaches 100 nm or better.^[2]^[1]

What is the overlay accuracy of the system?

Overlay accuracy (EGA, |M| + 3σ) is ≤ 20 nm, and three-sigma alignment accuracy is better than 23 nm.^[2]^[1]

Not publicly documented

The following facts about the S 306 C are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented variants, configuration options, or revision breakpoints of the S 306 C are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 306 C are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the S 306 C are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the S 306 C is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the S 306 C are on record.
Answerable by: an OEM parts catalog or a service engineer