Lam Research
Process parameters such as gas composition, pressure, and RF power are controlled to achieve the desired etch rate and selectivity. Systems of this class often include automated tuning and endpoint detection to ensure repeatable results across wafers.
In semiconductor fabrication, plasma etch systems are used after the photoresist pattern has been formed. The etch removes material from areas not protected by the resist. After etching, the remaining resist is stripped. The wafer then proceeds to downstream steps such as cleaning, inspection, and subsequent processing layers.
Plasma etch systems are employed for etching a variety of materials including silicon, silicon dioxide, silicon nitride, and many metals. Applications span integrated circuit manufacturing, microelectromechanical systems (MEMS) fabrication, and other devices that require precise material removal at the micron and sub‑micron scale.
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The following facts about the Rainbow 4400B SN2622-Parts are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Rainbow 4400B SN2622-Parts are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Rainbow 4400B SN2622-Parts are on record.
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The control-system platform and OS era of the Rainbow 4400B SN2622-Parts are not on record.
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No publicly documented failure modes or field errata for the Rainbow 4400B SN2622-Parts are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Rainbow 4400B SN2622-Parts is not on record.
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Last updated Oct 11, 2026.
The Lam Research Rainbow 4400B is a plasma etch system for 8-inch wafers.
The Lam Rainbow 4400B SN2333 is a Plasma Etch system for 8-inch wafers manufactured by Lam Research.
The Lam Rainbow 4420 SN3675 is a plasma etch system for 8-inch wafers manufactured by Lam Research.
The Lam Rainbow 4420-Crated is a plasma etch system from Lam Research configured for 8-inch wafers.