KLA
The KLA Surfscan 6220 is a wafer inspection system for particle detection and surface analysis on 200 mm wafers. The KLA Surfscan 6220 includes an MSP 2300 and SMIF opener. The KLA Surfscan 6220 is part of the Surfscan 62X0 series and shares a wafer puck with the Surfscan 6100.[1][2]

The KLA Surfscan 6220 is a wafer particle detection and inspection system designed for unpatterned wafers. The system is configured for 200 mm wafers and includes an MSP 2300, a SMIF opener, an auxiliary cabinet, a Crest tabletop unit, a chiller, pumps, a control PC, keyboard, mouse, and accessories.[1][3]
A wafer puck holds the substrate during scanning, and the system employs a dark-field configuration to maximize sensitivity to small particles. The tool can differentiate between particles and crystal-originated pits based on scattering characteristics.
Applications include incoming wafer inspection, process excursion monitoring, and tool cleanliness qualification. The tool can also measure surface haze to assess roughness or film quality.
Documented failure modes, common issues, and field considerations.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.
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The inspection sensitivity depends on the optical properties of the wafer surface. Operators can typically adjust laser power, polarization, and detection thresholds to optimize signal-to-noise for specific film types and surface roughness.
Yes. The system uses calibrated light-scattering signals to estimate defect dimensions. However, size accuracy is limited by the optical model and typically requires correlation with scanning electron microscopy (SEM) for precise sizing.
Throughput varies widely by wafer size and required sensitivity, but production systems are designed to inspect multiple wafers per hour while maintaining high defect capture efficiency.
The class described here is optimized for bare or lightly patterned wafers. For dense patterned wafers (device layers), other inspection techniques such as bright-field or e-beam are typically used. However, some advanced laser scatter tools can handle low-density patterns with dedicated algorithms.
The following facts about the Surfscan 6220 Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Surfscan 6220 Wafer are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Surfscan 6220 Wafer are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Surfscan 6220 Wafer are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Surfscan 6220 Wafer is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly hosted manuals, SOPs, or datasheets for the Surfscan 6220 Wafer are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Oct 2, 2026.
The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.