Waferpedia

Hitachi

S 9300

Metrology & InspectionHitachi S 9300 family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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Power

6kVA Single Phase[2]

Gas delivery

Nitrogen, Oil free Air (OFA), PCW Glycol[3]

Optics

1000x to >300000x[3]

What it is

The S 9300 is a critical-dimension scanning electron microscope (CD-SEM). The system is classified as a metrology and inspection tool.[4][3]

How it works

The S 9300 employs a Schottky emission electron gun. The accelerating voltage is adjustable from 500V to 1600V in 10V steps. The electron optical system uses a three-stage electromagnetic lens and a two-stage electromagnetic deflection coil. Astigmatism correction is performed by an eight-pole electromagnetic coil. The probe current is 4 to 24pA with automated setting and measurement by Faraday cup. The field of view is 1.2mm. The depth of focus is at least 1.0µm at 80000x magnification. Resolution is 3nm at 800V in retarding/boosting mode. Magnification ranges from 1000x to greater than 300000x.[3]

Where it fits in the process flow

The S 9300 handles 200mm wafers and is convertible to 300mm with a conversion kit. The system includes a 200mm wafer handling system with two cassette holders equipped with ergo flippers. The wafer imaging covers X from 5 to 295mm and Y from 5 to 195mm. The system also supports notch-down alignment.[3][2]

What do the numbers mean?

Power & electrical5

Power requirement
6kVA Single Phase[2]
Accurate?
Accelerating voltage
500V to 1600V, 10V steps[3]
Accurate?
Electromagnetic Lens
3-Stage Electromagnetic Lens with boosting voltage[3]
Accurate?
Field control method
Continuously on for sample decharging at all voltages[3]
Accurate?
Resolution
3nm (800V) Retarding/Boosting Mode[3]
Accurate?

Vacuum & pumping1

Objective Lens
4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[3]
Accurate?

Wafer handling7

Wafer Size
200mm & 300mm[2]
Accurate?
Wafer Size (CD SEM specification)
200mm[3]
Accurate?
Wafer Imaging
X coverage from 5 – 295mm, Y coverage from 5 – 195mm[3]
Accurate?
Wafer imaging ability
Entire surface of 8” or 12” wafer[3]
Accurate?
Wafer Handling System
200mm Wafer Handling System, (2) Cassette holders with ergo flippers, Convertible to 300mm with conversion kit[3]
Accurate?
Wafer size
200mm and 300mm[2]
Accurate?
Wafer size
200mm[3]
Accurate?

Gas & chemistry1

Chemicals Used
Nitrogen, Oil free Air (OFA), PCW Glycol[3]
Accurate?

Optics & imaging3

Magnification
1000x to >300000x[3]
Accurate?
Depth of focus
≥ 1.0um at 80000x magnification[3]
Accurate?
Optical Microscope System
Monochrome Image using CCD camera, 110x Magnification[3]
Accurate?

Control & software5

Components
Main unit, Supply unit, Control unit[2]
Accurate?
Operating System
Unix version HP-UX 10.20 or newer[3]
Accurate?
Software Version
14.71 or newer[3]
Accurate?
SECS/GEM Communication Interface
Yes[3]
Accurate?
Control system OS
Unix version HP-UX 10.20 or newer[3]
Accurate?

Configuration & options20

Model
S-9300[1]
Accurate?
Type
Scanning Electron Microscope (SEM)[1]
Accurate?
Year of manufacture
09-1999[2]
Accurate?
Serial number
0301-03[2]
Accurate?
Vintage
1996[1]
Accurate?
Electron Gun
Schottky emission source[3]
Accurate?
Field of view
1.2mm[3]
Accurate?
Probe Current
4~24pA with automated setting and measurement by Faraday cup[3]
Accurate?
Scan Coil
2-Stage Electromagnetic Deflection[3]
Accurate?
Astigmatism correction
via 8-pole electromagnetic coil[3]
Accurate?
Workstation Model
HP B180L (9GB)[3]
Accurate?
Dual XY Hitachi Microscale
Yes[3]
Accurate?
DSP Image Processing
Yes[3]
Accurate?
BSE Mode
Yes[3]
Accurate?
Multipoint Measurement Function
Yes[3]
Accurate?
Edge Roughness Function
Yes[3]
Accurate?
Automated Image Archiving Function
Yes[3]
Accurate?
Equipment type
Scanning Electron Microscope[1]
Accurate?
System type
CD-SEM system[4]
Accurate?
Workstation
HP B180L (9GB)[3]
Accurate?
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Power requirement6kVA Single Phase[2]
  • Accelerating voltage500V to 1600V, 10V steps[3]
  • Electromagnetic Lens3-Stage Electromagnetic Lens with boosting voltage[3]
  • Objective Lens4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[3]
  • Field control methodContinuously on for sample decharging at all voltages[3]
  • Resolution3nm (800V) Retarding/Boosting Mode[3]
  • Chemicals UsedNitrogen, Oil free Air (OFA), PCW Glycol[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What kind of data does this class of machine provide?General reference — not yet source-verified

Depending on the sensing method, it can provide images, dimensional measurements, surface-condition information, or defect-location data.

What kinds of samples are inspected?General reference — not yet source-verified

Such systems are used on semiconductor and other precision-manufactured parts with small features, fine patterns, or sensitive surface conditions.

Not publicly documented

The following facts about the S 9300 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 9300 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the S 9300 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the S 9300 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the S 9300 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the S 9300 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]ptwsingapore.com — ptwsingapore.comptwsingapore.com
  3. [3]fabsurplus.com — fabsurplus.comfabsurplus.com
  4. [4]classoneequipment.com — classoneequipment.comclassoneequipment.com
  5. [5]Equipment inventory listing
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Last updated Sep 28, 2026.

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