CEE
The CEE 200XD is a develop spinner. The CEE 200XD accepts up to 6 in wafers. The CEE 200XD is part of the photolithography spin/bake/expose/develop equipment at Utah Nanofab.[1][2]
Plate 01Cee 200XD Inv# 63858
Plate 02Cee 200XD Part 2
The CEE 200XD Develop Spinner is used with lift-off resist workflows at Utah Nanofab.[1]
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The CEE 200XD Develop Spinner belongs to the lithography spin coater class.[2]
The CEE 200XD Develop Spinner is grouped with spin coaters in the lithography area, alongside aligners and ovens.[2]
The following facts about the 200XD are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 200XD are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 200XD are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 200XD are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 200XD are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 200XD is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 3, 2026.