Waferpedia

ASML

PAS 2000

LegacyLithographyIntroduced Produced 1985–ASML PAS 2000 family
Research Quality: 50% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The PAS 2000 is a wafer stepper that was ASML's first lithography product. The PAS 2000 used oil pressure to move the wafer, which caused leakage. The PAS 2000 achieved a critical dimension between 1.0 and 1.3 micron and an overlay accuracy of 0.25 micron.[1][2][3]

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Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Produced

1985–

Vacuum

Oil pressure instead of electric motors[1]

Performance

0.25 micron[2]

Preceded by
First in line
This tool
PAS 2000
Succeeded by
PAS 5500
All related

How it works

The PAS 2000 was a commercial and technical failure, in part because of the leaking oil-pressure wafer-stage mechanism.[1][4][3]

Applications

The PAS 2000 was used for the production of integrated circuits.[2][4][3]

  • Production of integrated circuits

Why won't it start?

Documented failure modes, common issues, and field considerations.

  • Commercial and technical failure
  • Oil-pressure wafer movement had a tendency to leak

What do the numbers mean?

Vacuum & pumping3

Wafer motion mechanism
Oil pressure instead of electric motors[1]
Accurate?
Wafer movement mechanism
Oil pressure[1]
Accurate?
Wafer movement mechanism
oil pressure (instead of electric motors)[1]
Accurate?

Performance1

Overlay accuracy
0.25 micron[2]
Accurate?

Dimensions & facilities1

Critical dimension
1.0 to 1.3 micron[2]
Accurate?

Configuration & options1

Product type
Lithography machine[1]
Accurate?

Vintage & configurations

  1. 1984First product[1]

    ASML's first product was the PAS 2000.

  2. 1984First product introduced[1]

    ASML's first product, the PAS 2000, was introduced.

  3. 1985-06-30Production start[2]

    Referenced with relevant date 1985-06-30 in the source entry for the PAS 2000 wafer stepper.

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What replaced it?

  • successorASML PAS 5500— ASML developed the PAS 5500 after the PAS 2000; the PAS 5500 became the company's first commercial breakout.source[1]
  • successorASML PAS 2400— The PAS 2400 was an improvement over the PAS 2000, which had used oil pressure and was a commercial and technical failure.source[1]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Wafer motion mechanismOil pressure instead of electric motors[1]
  • Wafer movement mechanismOil pressure[1]
  • Wafer movement mechanismoil pressure (instead of electric motors)[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

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Frequently asked questions

What was the ASML PAS 2000?

The ASML PAS 2000 was ASML's first product, a wafer stepper used in semiconductor photolithography.[1][2]

When was the PAS 2000 introduced?

The PAS 2000 was introduced in 1984.[3]

What was a notable design feature of the PAS 2000?

The PAS 2000 used an oil-pressure mechanism instead of electric motors to move the wafer during exposure, which had a tendency to leak.[1][3]

Was the PAS 2000 a commercial success?

The PAS 2000 was a commercial and technical failure.[1][4]

Not publicly documented

The following facts about the PAS 2000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented variants, configuration options, or revision breakpoints of the PAS 2000 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the PAS 2000 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • The process node or technology generation of the PAS 2000 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the PAS 2000 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the PAS 2000 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]en.wikipedia.org — en.wikipedia.orgen.wikipedia.org
  2. [2]chiphistory.org — chiphistory.orgchiphistory.org
  3. [3]PAS 2000 — ASML | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  4. [4]PAS 2000 Wafer Stepper by ASML product specification & brochure — chiphistory.orgchiphistory.org
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Last updated Oct 10, 2026.

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