Applied Materials
Centura Enabler 300 Dry
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedA dry etcher removes material from a wafer using a process gas rather than liquid chemistry.
The etch chamber creates a controlled plasma environment that directs reactive species toward exposed regions on the wafer surface.
Where it fits in the process flow
General reference — not yet source-verifiedThe tool follows lithographic pattern definition and precedes later cleaning, metrology, and downstream process steps that use the etched features.
Applications
General reference — not yet source-verifiedDry etch tools of this class are used for anisotropic material removal in integrated-circuit fabrication.
What do the numbers mean?
Wafer handling1
Configuration & options4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Centura Enabler 300 Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura Enabler 300 Dry are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura Enabler 300 Dry are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura Enabler 300 Dry are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura Enabler 300 Dry are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura Enabler 300 Dry is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Oct 3, 2026.
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