Applied Materials
Centura 5200 HTF EPI
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedThe Centura family is a semiconductor process platform used for thin-film deposition tasks in fabrication lines. The EPI designation identifies the machine as an epitaxial deposition tool.
How it works
General reference — not yet source-verifiedEpitaxial deposition forms a crystalline silicon layer on a prepared silicon substrate. The process is used when the deposited layer must follow the crystal orientation of the underlying wafer.
The tool operates as a deposition system rather than a patterning or metrology tool. The machine supports epitaxial silicon growth on wafers in a controlled process chamber environment.
Where it fits in the process flow
General reference — not yet source-verifiedThe Applied Materials Centura 5200 HTF EPI sits in the front-end fabrication flow at the wafer surface preparation and film-growth stage. The machine is used before later patterning, etching, and metallization steps.
The tool produces an epitaxial silicon layer that can serve as a base for subsequent device fabrication steps. The deposited layer is part of the wafer structure used in downstream transistor and integrated-circuit processing.
What do the numbers mean?
Wafer handling2
Configuration & options6
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Applied Materials Centura 5200 HTF EPI | — | — | — | Equipment inventory listing[1] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Centura 5200 HTF EPI are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 HTF EPI are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Centura 5200 HTF EPI are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura 5200 HTF EPI are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura 5200 HTF EPI is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Centura 5200 HTF EPI are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]inventory listing
- [3]fabsurplus.com — fabsurplus.comfabsurplus.com
Last updated Oct 10, 2026.
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