Tool family
The Tegal 901ACS is a wide-gap diode reactor system for plasma etch operations on semiconductor substrates and wafers.
The Tegal 901ACS is a wide-gap diode reactor system for plasma etch operations on semiconductor substrates and wafers.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Tegal 903ACS | — | — | Narrow gap diode reactor system; ideal for tightly-controlled, anisotropic etching of silicon dioxide and silicon nitride insulating layers. | plasmatherm.com[1] |
| Tegal 981ACS | — | — | Scaled-up version of the 901ACS; built to handle 150 mm and 200 mm diameter wafers, 100 mm square wafers, and 6-inch square wafers. | plasmatherm.com[1] |