Waferpedia

Tool family

STS 310

STSDeposition1 entry

The STS 310 is a plasma-enhanced chemical-vapor-deposition system used in the source to deposit silicon dioxide and silicon nitride films.

LinkedIn X Email

Models in this family

  1. 310

    The STS 310 is a plasma-enhanced chemical-vapor-deposition system used in the source to deposit silicon dioxide and silicon nitride films.