KLA 8100

Models in this family

1. 

   8100 CD-SEM
2. 

   8100 Electronic Source

   The KLA 8100 Electronic Source is a KLA-manufactured equipment item with listed vacuum and beam-related specifications.

3. 

   8100 XP CD-SEM

   The KLA 8100 XP is a critical dimension scanning electron microscope (CD-SEM) designed for automated CD measurements on silicon wafers and reticles, featuring production-proven electron optics for bottom imaging of high aspect ratio structures.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   8100XP-R	—	—	Optimized for reticle-specific applications; includes Advanced Charge Elimination (ACE) for stable imaging on chrome-on-glass and phase shift masks; enhanced resolution extends linear measurement range to below 0.15 µm	web.archive.org[1]
   8100-T	—	—	Fastest fully automated e-beam metrology system for CD and thin film head imaging; combines secondary and backscatter electron imaging for precise pattern recognition and focusing at zero throat; reticle measurements possible	web.archive.org[1]
   8300	—	—	Extension of 8100 CD SEM product line for 300 mm wafers; field-proven electron optics from 8100XP; modular RITe loader; dual FOUP (13 or 25 wafer) or dual cassette configurations; accommodates 200 mm wafers; advanced networking and automation; highest throughput in class	web.archive.org[1]
   8100XP-R CD SEM	—	—	Optimized for reticle-specific applications.	web.archive.org[1]
   8100-T CD SEM	—	—	Used for critical dimension measurement and thin film head imaging; reticle measurements are also possible.	web.archive.org[1]

Sources