Tool family
EVG40 is an EV Group top-to-bottom side alignment accuracy measurement inspection system for non-destructive measurement of repeatable alignment accuracy.
EVG40 is an EV Group top-to-bottom side alignment accuracy measurement inspection system for non-destructive measurement of repeatable alignment accuracy.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| EVG40 Standard | — | — | Basic unit with alignment stage optics | web.archive.org[1] |
| EVG40 Advanced | — | — | Basic unit with alignment stage optics and advanced features including image recognition system, quick transparent overlay, and linewidth measurement mode | web.archive.org[1] |
| EVG40 Semi-Automated | — | — | Basic unit with alignment stage optics and advanced features including image recognition system, quick transparent overlay, linewidth measurement mode, programmable microscope stage rack, and motorized chuck rotation | web.archive.org[1] |
| EVG40 Fully-Automated | — | — | Basic unit with alignment stage optics and advanced features including image recognition system, quick transparent overlay, linewidth measurement mode, programmable microscope stage rack, motorized chuck rotation, and robotic autoload cassette-to-cassette | web.archive.org[1] |
| EVG40 AUTOMATED | — | — | Mentioned as a field-upgrade target from the semi-automated version | web.archive.org[1] |
| EVG40 Standard Basic Unit | — | — | Alignment Stage Optics | web.archive.org[1] |
| EVG40 Advanced Basic Unit | — | — | Alignment Stage Optics; Advanced Features: Image Recognition System, Quick Transparent Overlay, Linewidth Measurement Mode | web.archive.org[1] |
| EVG40 Semi-Automated Basic Unit | — | — | Alignment Stage Optics; Advanced Features: Image Recognition System, Quick Transparent Overlay, Linewidth Measurement Mode; Automation Features: Programmable Microscope Stage Rack, Motorized Chuck Rotation | web.archive.org[1] |
| EVG40 Fully-Automated Basic Unit | — | — | Alignment Stage Optics; Advanced Features: Image Recognition System, Quick Transparent Overlay, Linewidth Measurement Mode; Automation Features: Programmable Microscope Stage Rack, Motorized Chuck Rotation, Robotic Autoload Cassette-to-Cassette | web.archive.org[1] |
| EVG40 NT | — | — | Stand-alone automated measurement system enabling measurement of lithography-relevant parameters like critical dimensions, as well as bond alignment accuracy; top-to-bottom side microscope; PC-based measurement and pattern recognition software | evgroup.com[2] |
| EVG40 NT2 | — | — | Referenced as EVG's industry benchmark system against which the EVG40 D2W achieves up to 15X higher throughput | evgroup.com[3] |
| EVG40 D2W | — | — | Die-to-wafer overlay metrology platform for 100 percent die overlay measurement; dual focus optics, infrared light, universal measurement process, up to 5-parameter overlay model | evgroup.com[3] |