Comparison ledger
YES 1000P, YES R3A, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000PYES | R3AYES |
|---|---|---|
| OEM | YES | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1998 Acquisition | — |
| Control system | — | — |
| Generation | — | — |
| Family | YES 1000P | YES R3A |
| Specifications | ||
| Model | 1000P[1] | — |
| System type | Plasma cleaning system[1] | — |
| Shelf configuration | Four 16 x 16 inch shelves[1] | — |
| Total capacity | 1024 square inches[1] | 390 square inches[1] |
| Control system | PLC driven with plain English real time process readout and diagnostics in the event of system abort[1] | — |
| Number of shelves | 4[1] | — |
| Shelf size | 16 x 16 inches[1] | — |
| Power | 1000 W[2] | 500W[3] |
| Configuration | Parallel plate[2] | — |
| Operation modes | Active, RIE, Downstream[1] | — |
| Sample size range | From smallest semiconductor chip to large flat panels[1] | — |
| Model designation | — | Glen/YES R3A[1] |
| Alternate designation | — | YES-R3[1] |
| Series | — | R-Series plasma cleaning systems[1] |
| Position in series | — | smallest of the series[1] |
| Intended use | — | designed for pilot run quantities[1] |
| Sample trays | — | two 14 x 14 inch sample trays[1] |
| Frequency | — | 40kHz (low-frequency)[3] |
| Platen/Chamber Size | — | 14 x 14-inch, two-shelf configuration[3] |
| Operational Modes | — | Active Plasma, RIE, Downstream[3] |
| Process Type | — | Batch-process, low-frequency plasma cleaning[3] |
| Primary Application | — | Surface treatment including photoresist stripping (not primary use in Protofab)[3] |
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