Comparison ledger
SUSS MicroTec MA / BA Gen4 Pro Series, SUSS MicroTec MA100 / 150e Gen2, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA / BA Gen4 Pro SeriesSUSS MicroTec | MA100 / 150e Gen2SUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 150mm | 150mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | Gen4 | Gen2 |
| Family | SUSS MicroTec MA / BA Gen4 Pro Series | SUSS MicroTec MA100 / 150e Gen2 |
| Cited variants |
| — |
| Specifications | ||
| Type | Semi-automated system[1] | Automated system[1] |
| Wafer size | up to 150 mm / 200 mm[1] | up to 150 mm[1] |
| Mask alignment | Yes[1] | — |
| Bond alignment | Yes[1] | — |
| Exposure | Yes[1] | — |
| UV bonding | Yes[1] | — |
| Fusion bonding | Yes[1] | — |
| Micro- and nanoimprinting | Yes[1] | — |
| Selective plasma activation | Yes[1] | — |
| Function | — | Mask Alignment, Exposure[1] |
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