Comparison ledger
STS ICP, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ICPSTS | 1512eTegal |
|---|---|---|
| OEM | STS | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | STS ICP | Tegal 1512e |
| Cited variants | — | |
| Specifications | ||
| Voltage | 400 V[3] | — |
| Frequency | 50 Hz[3] | — |
| Technology | Inductively Coupled Plasma (ICP)[3] | — |
| Tool type | Inductively coupled plasma etcher[3] | Industrial RIE plasma etcher system[4] |
| Electrical configuration | 400 V, 50 Hz[3] | — |
| Process class | Dry etcher[2] | — |
| Wafer size | 100 mm wafers[2] | — |
| Chemistry | Chlorine and bromine chemistry[2] | — |
| Stated configuration | — | With modules assembly for CI-4222[4] |
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