Comparison ledger
Semitool 11600 SRD, Tokyo Electron Expedius Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | Expedius PlusTokyo Electron |
|---|---|---|
| OEM | Semitool | Tokyo Electron |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2007 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool 11600 SRD | Tokyo Electron Expedius |
| Specifications | ||
| Configuration | Ceramic[1] | Resistivity monitoring (Horiba)[2] |
| Manufacturer | Semitool[1] | — |
| Model | 11600 SRD[1] | Expedius Plus[2] |
| Equipment type | Spin Rinse Dryer[1] | Wet Bench[2] |
| Application | — | Pre-Diffusion Clean[2] |
| Bath-1 | — | SPM[2] |
| Operating | — | 110 - 150°C, H2SO4/H2O2 (3:1), circulation[2] |
| Chemical spiking | — | auto concentration feedback[2] |
| Bath Material | — | Quartz[2] |
| Bath-2 | — | QDR (hot)[2] |
| Megasonic | — | 950 kHz, 2400W (600*4)[2] |
| Bath-3 | — | APM[2] |
| Bath-4 | — | POU[2] |
| Bath-5 | — | HPM[2] |
| Bath-6 | — | QDR (hot)[2] |
| Dryer | — | SD2[2] |
| OEM | — | Tokyo Electron[2] |
| Vintage | — | 2007[2] |
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