Comparison ledger
Ontrak DSS 200 Post, Strasbaugh 100R16, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | DSS 200 PostOntrak | 100R16Strasbaugh |
|---|---|---|
| OEM | Ontrak | Strasbaugh |
| Category | CMP | CMP |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ontrak DSS 200 | Strasbaugh 100R16 |
| Cited variants | — | |
| Specifications | ||
| Configuration | With Hepa Mini-Environment[3] | — |
| Tool type | double-sided PVA scrubber[2] | — |
| Wafer size range | 100mm to 200mm[1] | — |
| Throughput | 45-65 wafers per hour[2] | — |
| Post-CMP cleaning applications | oxide, polysilicon, nitride, tungsten, aluminum and copper[2] | — |
| type | — | 1 spindle grinder/polisher[5] |
| drive system | — | DC drive system with 2 motors[5] |
| spindle RPM | — | 1-180 RPM[5] |
| eccentric RPM | — | 1-90 RPM[5] |
| controls | — | digital timer; air down switch; spindle and eccentric speed dials; air regulators[5] |
| capacity | — | 16 inches[5] |
| spindle size | — | 1-8 TPI[5] |
| overall dimensions | — | 28 inches x 36 inches x 48 inches[5] |
| weight | — | 500 lbs[5] |
| origin | — | made in the USA[5] |