Waferpedia

Comparison ledger

SEZ 203 Spinversus1512e

Lam Research SEZ 203 Spin, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SEZ 203 SpinLam Research
1512eTegal
OEMLam ResearchTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research SEZTegal 1512e
Cited variants
  • 2004 vintage[1]
  • 2010 vintage[2]
  • 1998 vintage[3]
  • Lam / SEZ 203 Spin Etcher (1998 vintage)[3]
  • Lam / SEZ 203 Spin Etcher (2004 vintage)[1]
  • Lam / SEZ 203 Spin Etcher (2010 vintage)[2]
  • Lam SEZ 203 Spin Processor (8 inch)[4]
  • SEZ 203 Spin Processing Wet System (200mm)[5]
—
Specifications
Software Version12.29.09.2000[2]—
CIMGEM[2]—
ConfigurationProcess; Backside Clean[2]—
Handler SystemRobot[2]—
Factory InterfaceSMIF (2)[2]—
ProcessCobalt Backside Clean[3]—
Options SystemUPS[3]—
Wafer size8 inch (200mm)[2]—
Vintage1998[3]—
Wafer HandlingBernoulli (chuck, grippers, handling)[4]—
Open cassettes2[4]—
Chemical cabinets (CDS)3[4]—
System typeSpin Processing Wet System[5]—
MakeLam / SEZ[1]—
Model203[1]—
Wafer carrierTwo open cassettes[4]—
Chemical cabinets3 chemical cabinets (CDS)[4]—
Wafer handlingBernoulli wafer handling[4]—
ChuckBernoulli chuck[4]—
GrippersBernoulli grippers[4]—
Wafer Sizes8 inch[2]—
Bernoulli wafer handlingYes[4]—
Bernoulli chuckYes[4]—
Bernoulli grippersYes[4]—
OEMLam / SEZ[1]—
Equipment typeSpin Etcher[1]—
Chemical Cabinets3 (CDS)[4]—
Vintage year1998[3]—
Wafer handling typeBernoulli (chuck, grippers)[4]—
Tool type—Industrial RIE plasma etcher system[6]
Stated configuration—With modules assembly for CI-4222[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]tech-semi.comtech-semi.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]semistarcorp.comsemistarcorp.com