Waferpedia

Comparison ledger

Rainbow 4520 i Dielectricversus100 ICP Fluorine

Lam Research Rainbow 4520 i Dielectric, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
100 ICP FluorineOxford Instruments
OEMLam ResearchOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Rainbow 4520 i DielectricOxford Instruments 100 ICP Fluorine
Specifications
Wafer Size6 inch[1]—
MakeLam[2]—
ModelRainbow 4520 i[2]—
ApplicationDielectric etching[2]—
Etch Gases—SF6, CF4, O2, Ar, N2, CHF3, C4F8[3]
Cryo DRIE etch rate—up to 5 µm/min[3]
Wafer size—4 inch, 6 inch, 8 inch (with clamp change)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]nanofab.utah.edunanofab.utah.edu