Comparison ledger
Lam Research Rainbow 4420, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4420Lam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1994 Vintage year | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4420 | Oxford Instruments 100 ICP Fluorine |
| Cited variants |
| — |
| Specifications | ||
| Configuration | Refurbished[2] | — |
| Software version | Envision 1.5 Release[1] | — |
| Handler System | Harmonics Arm (2)[1] | — |
| Volts | 208[1] | — |
| Wafer Shape | 8" flat zone[3] | — |
| Process | Poly Etch[3] | — |
| Software | Envision 1.5[3] | — |
| Wafer Aligner | Universal[4] | — |
| Wafer Sizes | 8 inch[1] | — |
| Software Version | Envision 1.5[1] | — |
| CIM SECS | Yes[1] | — |
| Factory Interface | SMIF (2)[1] | — |
| LL Pump | Yes[1] | — |
| TCU 2080 | Yes[1] | — |
| AC Rack | Yes[1] | — |
| PC Pump | Yes[1] | — |
| Vintage | 1994[1] | — |
| Dry Pump | Yes[3] | — |
| Chiller | Yes[3] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[5] |
| Cryo DRIE etch rate | — | up to 5 µm/min[5] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[5] |
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