Comparison ledger
KLA .498 PSL Wafer, KLA Quantox, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | QuantoxKLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .498 PSL Wafer | KLA Quantox |
| Cited variants | — | |
| Specifications | ||
| Configuration | NIST Traceable[3] | — |
| NIST traceability | Yes[3] | — |
| Measurement principle | — | Non-contact, corona-based[4] |
| Measured parameters | — | Charge composition, interface quality, dielectric thickness, charge contamination[4] |
| Metallic contamination detection | — | Fe, Al, Cu, Na[4] |
| Operating system | — | Windows NT[4] |
| Wafer sizes supported | — | 200 mm, 300 mm[4] |
| Technology node | — | 130 nm and below[1] |
| Gate dielectric materials | — | SiON, high-k[1] |
| Accuracy | — | 0.10 Å[1] |
| Correlation with device parameters | — | >95%[1] |
| Technology | — | ACTIV[1] |
| Interface | — | SECS/GEM[4] |
| CE compliance | — | Compliant with EC Machinery, Low Voltage, and EMC directives[4] |
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