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Comparison ledger

F20versus1050 UV-VIS

Filmetrics F20, Perkin Elmer 1050 UV-VIS, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
F20Filmetrics
1050 UV-VISPerkin Elmer
OEMFilmetricsPerkin Elmer
CategoryPrecision OpticsPrecision Optics
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyFilmetrics F20Perkin Elmer 1050 UV-VIS
Cited variants—
Specifications
Measurement techniquereflectance / optical reflectometry[2]—
Primary measurementfilm thickness[2]—
Materials measureddielectrics, semiconductors, and thin metals[2]—
Spot sizelarge spot[2]—
Optical modelmultilayer optical models[2]—
General use descriptiongeneral purpose film-measurement instrument[1]—
Wavelength range (F20-EXR variant mentioned in source)400-1700 nm[1]—
TechniqueOptical reflectometry (spectral reflectance)[3]—
MeasurementFilm thickness and refractive index (n & k)[2]—
Beam size (ASU configuration)Large spot[2]—
Beam size (Utah configuration)Small spot[4]—
AnalysisMultilayer optical models[2]—
Wavelength range (F20-EXR variant)400–1700 nm[1]—
Asset ID—82948[5]
Last Confirm Date—August 23, 2024[5]
Manufacturer—Perkin Elmer[5]
Model—1050[5]
Instrument type—Spectrometer[5]
Use—Analyzing ultraviolet and visible light absorption spectra[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]cores.research.asu.educores.research.asu.edu
  3. [3]cores.research.asu.educores.research.asu.edu
  4. [4]nanofab.utah.edunanofab.utah.edu
  5. [5]waferpedia.comwaferpedia.com